Nikon CF Plan 50x Epi ELWD Infinity Corrected Objective

High-resolution 50× industrial objective with exceptional 8.7mm working distance for reflected light microscopy of opaque materials and metallurgical specimens.

• 🔬 50× Magnification, 0.55 NA — Excellent resolving power for detailed surface inspection and microstructural analysis.
• 📏 8.7mm Extra-Long Working Distance — Exceptional clearance accommodates thick, uneven, or mounted specimens while maintaining optical performance.
• 🌓 CF Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
• ∞ Infinity-Corrected Optics — CF (Crystal Focus) design ensures compatibility with Nikon infinity-corrected microscope systems.
• ✨ New in Box Condition — Factory-new objective with full optical performance and manufacturer specifications.

🔧 Product Description

The Nikon CF Plan 50× Epi ELWD Objective (MUL03500) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines medium-high magnification with exceptional working distance, enabling detailed inspection of complex surface features while maintaining generous clearance between the objective and specimen.

The 50× magnification and 0.55 numerical aperture provide an optimal balance between field of view and resolution, making this objective ideal for examining microstructural features, grain boundaries, phase composition, and surface defects that require more detail than low-magnification objectives can provide, while offering a larger field of view than 100× objectives. This magnification range is particularly valuable for metallographic analysis, semiconductor inspection, and quality control applications where operators need to survey larger areas while maintaining the ability to resolve fine details.

The 8.7mm extra-long working distance (ELWD) is a standout feature of this objective—nearly double the working distance of standard 50× objectives. This extended clearance provides significant advantages when examining:

• Thick specimens or samples mounted in fixtures
• Rough or highly textured surfaces with significant topographical variation
• Tilted or angled specimens requiring oblique viewing
• Samples requiring manipulation or probing during observation
• Specimens in environmental chambers or specialized holders

The CF Plan (Crystal Focus Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings and design elements that maximize contrast and image quality when examining opaque materials.

The infinity-corrected optical design enables integration with tube lenses, beam splitters, camera systems, and other optical accessories without introducing aberrations. This design provides flexibility for advanced imaging workflows including digital documentation, measurement, and analysis.

The RMS thread mount is compatible with Nikon infinity-corrected industrial microscopes and other microscope systems accepting RMS-threaded objectives.

This unit is brand new in box, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Metallographic analysis and grain structure examination
• Semiconductor wafer and die inspection
• Surface defect detection and coating analysis
• Industrial quality control and failure analysis
• Materials science research and characterization
• Precision machined surface evaluation
• Educational and training laboratories
• Forensic materials examination

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.