NIKON CF PLAN 2.5X EPI OBJECTIVE

Low-magnification 2.5× industrial objective with 8.8mm working distance for wide-field reflected light microscopy and specimen survey.

• 🔍 2.5× Magnification, 0.45 NA — Wide field of view ideal for specimen survey, feature location, and low-magnification inspection.
• 📏 8.8mm Working Distance — Generous clearance accommodates varied sample geometries and manipulation during observation.
• 🌓 CF Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
• ∞ Infinity-Corrected Optics — CF (Crystal Focus) design ensures compatibility with Nikon infinity-corrected microscope systems.
• ✨ Excellent Condition — Pre-owned objective in excellent working order with full optical performance.

🔧 Product Description

The Nikon CF Plan 2.5× Epi Objective (MUL00030) is a low-magnification industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective provides wide-field viewing essential for initial specimen survey, feature location, and low-magnification inspection work.

The 2.5× magnification and 0.45 numerical aperture deliver a large field of view that enables operators to quickly survey specimens, locate features of interest, and assess overall sample condition before switching to higher magnifications for detailed examination. This magnification is particularly valuable in quality control environments where operators need to rapidly scan parts for defects, in failure analysis where the location of damage must be identified before detailed investigation, and in metallographic analysis where overall microstructure must be assessed before examining specific features.

The 8.8mm working distance provides generous clearance for accommodating thick specimens, samples mounted in fixtures, or parts with irregular geometries. This extended working distance also enables manipulation during observation—operators can use probes, tools, or measurement devices while viewing the sample, making this objective valuable for interactive inspection and measurement tasks.

The CF Plan (Crystal Focus Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge. This is particularly important at low magnifications where the field of view is large—flat-field correction eliminates the need to refocus when examining features at different positions in the field, improving inspection efficiency and measurement accuracy.

The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings and design elements that maximize contrast and image quality when examining opaque materials.

The infinity-corrected optical design enables integration with tube lenses, beam splitters, camera systems, and other optical accessories without introducing aberrations, providing flexibility for digital documentation and analysis workflows.

The RMS thread mount is compatible with Nikon infinity-corrected industrial microscopes and other microscope systems accepting RMS-threaded objectives.

This unit is in excellent pre-owned condition, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Initial specimen survey and feature location
• Quality control and defect screening
• Failure analysis and damage assessment
• Metallographic overview and microstructure survey
• Large-area inspection and documentation
• Interactive measurement and manipulation tasks
• Educational demonstrations and training
• Low-magnification photomicrography

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.