Nikon CF Plan 100x ELWD BD DIC Objective

The Nikon CF Plan 100X BD ELWD DIC (MUM23901) is a premium reflected light objective combining brightfield (BD), darkfield, and differential interference contrast (DIC) capabilities in a single unit — eliminating the need to swap objectives when switching between surface imaging modes. The extra-long working distance (ELWD) of 2mm is exceptional for a 100X objective, providing generous clearance for large, mounted, or irregularly shaped specimens that would be impractical with standard working distance objectives. At 0.80 NA, it delivers high-resolution surface imaging without immersion media, making it ideal for non-contact inspection of semiconductor wafers, metals, ceramics, and other industrial materials. The M25 thread and infinity corrected design ensure compatibility with Nikon’s reflected light industrial microscope systems. Optics are in flawless condition; exterior shows some lettering wear consistent with prior use — optical performance is uncompromised. Manufactured in Japan to Nikon’s exacting standards.