Mitutoyo M Plan Apo 5x Objective (NA 0.14, WD 37.5mm, Infinity, M26)

The Mitutoyo M Plan Apo 5× Objective is a plan apochromat objective from Mitutoyo’s M Plan Apo series — delivering wide-area 5× magnification with an exceptional 37.5mm working distance and plan apochromat correction optimized for visible light. With a large field of view and 37.5mm working clearance, this objective is an ideal wide-area survey step in a multi-magnification M Plan Apo inspection workflow, providing maximum specimen access before stepping up to higher magnification objectives.

• 📏 Super long working distance: 37.5mm — exceptional clearance for a 5× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, industrial fixtures, and laser processing setups where standard objectives cannot reach
• 🔍 Wide-area 5× overview — low magnification for rapid survey and navigation of large specimen areas, enabling efficient identification of regions of interest before stepping up to 10×, 50×, or 100× M Plan Apo objectives
• 🌟 Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum
• 🔬 NA 0.14 — practical numerical aperture for a long working distance 5× objective, delivering good resolution for wide-area survey, defect location, and specimen navigation
• 💡 Visible light optimized — the standard visible-light version of the M Plan Apo 5×; for NIR applications (silicon wafer inspection, Raman spectroscopy, NIR laser delivery), see the M Plan Apo NIR 5× (378-822-5)
• ♾️ Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
• 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency visible light transmission and long service life
• ✅ Catalog number 378-802-12

🔧 Product Description

The Mitutoyo M Plan Apo 5× (378-802-12) is a wide-area survey objective from Mitutoyo’s M Plan Apo visible series — combining 5× magnification with a 37.5mm working distance and plan apochromat correction for versatile industrial and semiconductor inspection. The 37.5mm working distance provides clearance for the full range of semiconductor inspection fixtures, environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as ample room for beam delivery optics and collection systems. At 5×, this objective provides a wide field of view for rapid specimen survey and navigation — a natural step in a multi-magnification M Plan Apo workflow between the ultra-wide 2× overview and the more detailed 10× inspection before stepping up to 50× or 100× for high-magnification analysis. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, providing consistent image quality across the full field of view. For NIR or SWIR applications at 5×, see the M Plan Apo NIR 5× (378-822-5). Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-802-12.

🔎 Typical Applications

• Wide-area semiconductor and wafer surface survey at 5× before high-magnification inspection
• Rapid defect location and region-of-interest identification on large specimens
• Overview imaging in environmental chambers, cryostats, or vacuum systems requiring 37.5mm clearance
• Inspection of specimens in industrial fixtures or assemblies at low magnification
• Intermediate survey step in a multi-magnification M Plan Apo workflow (2× → 5× → 10× → 50× → 100×)
• Any wide-area visible-light inspection application requiring long working distance at 5×

📊 Key Specifications

University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.