Mitutoyo M Plan Apo 5x Objective (NA 0.14, WD 37.5mm, Infinity, M26)
Regular price
$740.00
The Mitutoyo M Plan Apo 5× Objective is a plan apochromat objective from Mitutoyo’s M Plan Apo series — delivering wide-area 5× magnification with an exceptional 37.5mm working distance and plan apochromat correction optimized for visible light. With a large field of view and 37.5mm working clearance, this objective is an ideal wide-area survey step in a multi-magnification M Plan Apo inspection workflow, providing maximum specimen access before stepping up to higher magnification objectives.
KEY FEATURES
- Super long working distance: 37.5mm — exceptional clearance for a 5× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, industrial fixtures, and laser processing setups where standard objectives cannot reach
- Wide-area 5× overview — low magnification for rapid survey and navigation of large specimen areas, enabling efficient identification of regions of interest before stepping up to 10×, 50×, or 100× M Plan Apo objectives
- Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum
- NA 0.14 — practical numerical aperture for a long working distance 5× objective, delivering good resolution for wide-area survey, defect location, and specimen navigation
- Visible light optimized — the standard visible-light version of the M Plan Apo 5×; for NIR applications (silicon wafer inspection, Raman spectroscopy, NIR laser delivery), see the M Plan Apo NIR 5× (378-822-5)
- Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
- 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency visible light transmission and long service life
- Catalog number 378-802-12
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Technical Specifications
| Catalog Number | 378-802-12 |
| Magnification | 5× |
| Numerical Aperture (NA) | 0.14 |
| Immersion Medium | Dry (air) |
| Working Distance | 37.5mm (Super Long Working Distance) |
| Spectral Range | Visible light |
| Optical Design | M Plan Apo (Plan Apochromat, visible light) |
| Correction | Infinity-corrected (brightfield) |
| Thread / Mount | M26 |
| Compatible Systems | Mitutoyo FS series; other infinity-corrected M26 systems |
| Country of Origin | Japan |
| SKU | 378-802-12 |
Microscope Compatibility
Typical Applications
Wide-area semiconductor and wafer surface survey at 5× before high-magnification inspection
Rapid defect location and region-of-interest identification on large specimens
Overview imaging in environmental chambers, cryostats, or vacuum systems requiring 37.5mm clearance
Inspection of specimens in industrial fixtures or assemblies at low magnification
Intermediate survey step in a multi-magnification M Plan Apo workflow (2× → 5× → 10× → 50× → 100×)
Any wide-area visible-light inspection application requiring long working distance at 5×
