Mitutoyo M Plan Apo 50x Objective (NA 0.55, WD 13mm, Infinity, M26)

In stock

SKU: 378-805-3

Regular price $3,075.00
The Mitutoyo M Plan Apo 50× Objective is a premium plan apochromat objective from Mitutoyo’s M Plan Apo series — delivering 50× magnification with an exceptional 13mm working distance and plan apochromat correction optimized for visible light. With 13mm of working clearance at 50×, this objective provides practical access to specimens in fixtures, chambers, and environments that are completely inaccessible to standard short-working-distance objectives, while delivering sub-micron resolution for detailed surface inspection and analysis.

KEY FEATURES

  • Long working distance: 13mm — exceptional clearance for a 50× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, industrial fixtures, and laser processing setups where standard objectives cannot reach
  • NA 0.55, 0.7µm resolving power — practical numerical aperture for a long working distance objective at 50×, delivering sub-micron resolution for semiconductor inspection, surface analysis, and high-magnification industrial imaging
  • Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum at 50×
  • Visible light optimized — the standard visible-light version of the M Plan Apo 50×; for NIR/SWIR applications (silicon wafer through-inspection, Raman spectroscopy, NIR laser delivery), see the M Plan Apo NIR 50× series (378-825-17 or 378-863-5 HR)
  • Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
  • 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency visible light transmission and long service life
  • Catalog number 378-805-3
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Product Overview

The Mitutoyo M Plan Apo 50× (378-805-3) is a long working distance plan apochromat objective combining 50× magnification with a 13mm working distance — providing the practical balance between magnification and working clearance that makes it one of the most versatile objectives in the M Plan Apo series for industrial and semiconductor inspection. The 13mm working distance provides clearance for the full range of semiconductor inspection fixtures, environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as ample room for beam delivery optics and collection systems that must coexist with the imaging objective. At 50× with a 0.48mm field of view (with Ø24 eyepiece), this objective provides a practical balance between field of view and resolution for detailed surface inspection, defect analysis, and feature measurement. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for accurate color-based defect analysis and documentation. At NA 0.55 with 0.7µm resolving power, this objective delivers sub-micron resolution for detailed inspection. For NIR or SWIR applications, see the M Plan Apo NIR 50× variants (378-825-17 for maximum WD, 378-863-5 for maximum NA). Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-805-3.

Technical Specifications

Catalog Number 378-805-3
Magnification 50×
Numerical Aperture (NA) 0.55
Immersion Medium Dry (air)
Working Distance 13mm (Long Working Distance)
Spectral Range Visible light
Resolving Power 0.7µm
Focal Depth 0.9µm
Focal Length 4mm
Field of View (Ø24 eyepiece) Ø0.48mm
Real FOV (1/2" chip camera) 0.10 × 0.13mm
Optical Design M Plan Apo (Plan Apochromat, visible light)
Correction Infinity-corrected (brightfield)
Thread / Mount M26
Compatible Systems Mitutoyo FS series; other infinity-corrected M26 systems
Country of Origin Japan
SKU 378-805-3

Microscope Compatibility

Typical Applications

Semiconductor and IC surface inspection at 50× in visible light
Defect analysis and documentation on polished surfaces, thin films, and coatings
High-magnification imaging in environmental chambers, cryostats, or vacuum systems
Inspection of specimens in industrial fixtures or assemblies requiring 13mm clearance
Laser processing and micro-machining requiring simultaneous visible-light imaging at 50×
Any application requiring 50× magnification where standard working distance is insufficient
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