Mitutoyo M Plan Apo NIR 50x High Resolution Objective (NA 0.65, WD 10mm, 480–1800nm, M26)

In stock

SKU: 378-863-5

$10,200.00
The Mitutoyo M Plan Apo NIR 50× High Resolution Objective is a premium near-infrared and short-wave infrared (SWIR) optimized plan apochromat objective from Mitutoyo’s M Plan Apo NIR series — delivering 50× magnification with an exceptional 10mm working distance, 0.4µm resolving power, and optimized transmission across an extraordinary 480–1800nm spectral range spanning the full visible and SWIR spectrum. The definitive choice for high-resolution SWIR imaging, silicon wafer inspection, Raman spectroscopy, and NIR/SWIR laser applications requiring both extended working distance and maximum spectral range.

KEY FEATURES

  • Exceptional spectral range: 480–1800nm (visible + NIR + SWIR) — the defining feature of this high-resolution version; transmission extending to 1800nm covers the full NIR and into the SWIR, enabling silicon wafer through-inspection, InGaAs camera imaging, SWIR fluorescence, and Raman spectroscopy with long-wavelength excitation lasers well beyond the range of standard NIR objectives
  • Long working distance: 10mm — exceptional clearance for a 50× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as clearance for beam delivery optics and collection systems
  • High resolution: 0.4µm resolving power, NA 0.65 — high numerical aperture for a long working distance NIR objective, delivering sub-micron resolution for detailed semiconductor inspection, Raman mapping, and high-magnification NIR/SWIR imaging
  • Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full 480–1800nm spectral range
  • Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
  • 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency NIR/SWIR transmission and long service life
  • Catalog number 378-863-5
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Product Overview

The Mitutoyo M Plan Apo NIR 50× High Resolution is the most capable objective in the M Plan Apo NIR series at 50× — combining plan apochromat correction, a 10mm working distance, and an extraordinary 480–1800nm spectral range that extends well into the short-wave infrared (SWIR). The 1800nm upper wavelength limit is a significant differentiator from standard NIR objectives (typically optimized to ~1000nm), enabling applications that require SWIR transmission including InGaAs camera imaging, SWIR fluorescence imaging, and Raman spectroscopy with long-wavelength excitation lasers (1064nm, 1550nm). For silicon wafer inspection, the extended SWIR range enables through-silicon imaging at wavelengths where silicon is highly transparent, enabling backside inspection, subsurface defect detection, and through-wafer imaging of thinned substrates with exceptional clarity. The 10mm working distance provides practical clearance for the full range of semiconductor inspection fixtures, environmental chambers, cryostats, and laser processing setups. At NA 0.65 with 0.4µm resolving power, this objective delivers sub-micron resolution for detailed Raman mapping, semiconductor feature inspection, and high-magnification NIR/SWIR imaging. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full 480–1800nm spectral range. Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-863-5.

Technical Specifications

Catalog Number 378-863-5
Magnification 50×
Numerical Aperture (NA) 0.65
Immersion Medium Dry (air)
Working Distance 10mm (Long Working Distance)
Spectral Range 480–1800nm (Visible + NIR + SWIR)
Resolving Power 0.4µm
Focal Depth 0.7µm
Focal Length 4mm
Field of View (Ø24 eyepiece) Ø0.48mm
Real FOV (1/2" chip camera) 0.10 × 0.13mm
Optical Design M Plan Apo NIR HR (Plan Apochromat, NIR/SWIR-optimized)
Correction Infinity-corrected (brightfield)
Thread / Mount M26
Compatible Systems Mitutoyo FS series; other infinity-corrected M26 systems
Country of Origin Japan
SKU 378-863-5

Microscope Compatibility

Typical Applications

Silicon wafer backside and through-silicon inspection using SWIR transparency at 50×
InGaAs camera imaging requiring SWIR transmission to 1800nm
High-spatial-resolution Raman spectroscopy mapping with NIR and SWIR excitation lasers
SWIR fluorescence imaging of biological and materials specimens
NIR/SWIR laser processing, delivery, and beam characterization at 50×
Subsurface defect detection in silicon and other SWIR-transparent materials

  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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    Guidance on compatibility, selection, and configuration