Mitutoyo M Plan Apo 10x Objective (NA 0.28, WD 33.5mm, Infinity, M26)
Regular price
$995.00
The Mitutoyo M Plan Apo 10× Objective is a plan apochromat objective from Mitutoyo’s M Plan Apo series — delivering wide-area 10× magnification with an exceptional 33.5mm working distance and plan apochromat correction optimized for visible light. With a 2.4mm field of view (with Ø24 eyepiece) and 33.5mm working clearance, this objective is the ideal wide-area survey starting point in a multi-magnification M Plan Apo inspection workflow, providing maximum specimen access and field coverage before stepping up to higher magnification objectives.
KEY FEATURES
- Super long working distance: 33.5mm — exceptional clearance for a 10× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, industrial fixtures, and laser processing setups where standard objectives cannot reach
- Wide field of view: Ø2.4mm (×24 eyepiece) — the widest field of view in the M Plan Apo visible series at 10×, enabling rapid survey and navigation of large specimen areas for efficient identification of regions of interest before stepping up to 50× or 100×
- Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum
- NA 0.28, 1.0µm resolving power — practical numerical aperture for a long working distance 10× objective, delivering good resolution for wide-area survey, defect location, and specimen navigation
- Visible light optimized — the standard visible-light version of the M Plan Apo 10×; for NIR applications, see the M Plan Apo NIR 10× (378-823-15)
- Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
- 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency visible light transmission and long service life
- Catalog number 378-803-3
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Technical Specifications
| Catalog Number | 378-803-3 |
| Magnification | 10× |
| Numerical Aperture (NA) | 0.28 |
| Immersion Medium | Dry (air) |
| Working Distance | 33.5mm (Super Long Working Distance) |
| Spectral Range | Visible light |
| Resolving Power | 1.0µm |
| Focal Depth | 3.5µm |
| Focal Length | 20mm |
| Field of View (Ø24 eyepiece) | Ø2.4mm |
| Real FOV (1/2" chip camera) | 0.48 × 0.64mm |
| Optical Design | M Plan Apo (Plan Apochromat, visible light) |
| Correction | Infinity-corrected (brightfield) |
| Thread / Mount | M26 |
| Compatible Systems | Mitutoyo FS series; other infinity-corrected M26 systems |
| Country of Origin | Japan |
| SKU | 378-803-3 |
Microscope Compatibility
Typical Applications
Wide-area semiconductor and wafer surface survey at 10× before high-magnification inspection
Rapid defect location and region-of-interest identification on large specimens
Overview imaging in environmental chambers, cryostats, or vacuum systems requiring 33.5mm clearance
Inspection of specimens in industrial fixtures or assemblies at low magnification
Starting objective in a multi-magnification M Plan Apo workflow (10× → 50× → 100×)
Any wide-area visible-light inspection application requiring long working distance at 10×
