Mitutoyo M Plan Apo NIR 10x Objective (NA 0.26, WD 30.5mm, Infinity, M26)

The Mitutoyo M Plan Apo NIR 10× Objective is a near-infrared optimized plan apochromat objective from Mitutoyo’s M Plan Apo NIR series — delivering wide-area 10× magnification with an exceptional 30.5mm working distance and optimized transmission across the visible and near-infrared spectrum (400–1000nm+). The ideal wide-area survey objective for NIR imaging, Raman spectroscopy, silicon wafer inspection, and NIR laser applications requiring maximum working clearance at low magnification.

• 🔦 NIR-optimized transmission (400–1000nm+) — optical glass and coatings selected for high transmission across the near-infrared spectrum, enabling silicon wafer inspection, Raman spectroscopy with NIR excitation lasers (785nm, 830nm, 1064nm), NIR laser delivery, and any wide-area NIR imaging application where standard objectives are opaque or poorly transmitting
• 📏 Super long working distance: 30.5mm — exceptional clearance for a 10× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as clearance for beam delivery optics and collection systems
• 🔍 10× wide-area NIR overview — low magnification for rapid survey and navigation of large specimen areas in NIR, enabling efficient identification of regions of interest before stepping up to higher magnification NIR objectives (20×, 50×, 100×)
• 🌟 Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible and NIR spectrum
• ♾️ Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
• 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency NIR and visible light transmission and long service life
• ✅ Catalog number 378-823-15

🔧 Product Description

The Mitutoyo M Plan Apo NIR 10× is a wide-area survey objective from Mitutoyo’s M Plan Apo NIR series — providing the broadest field of view in the NIR series at 10× with a 30.5mm working distance and NIR-optimized transmission from 400–1000nm+. At 10×, this objective provides the widest field of view in the M Plan Apo NIR lineup for rapid specimen survey and navigation — the natural starting point in a multi-magnification NIR inspection workflow before stepping up to the 20×, 50×, or 100× NIR objectives for detailed inspection. The 30.5mm working distance is exceptional, providing clearance for the full range of semiconductor inspection fixtures, environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as ample room for beam delivery optics and collection systems. The NIR-optimized transmission (400–1000nm+) enables silicon wafer inspection at NIR wavelengths where silicon is transparent, Raman spectroscopy with NIR excitation lasers, and NIR laser processing and delivery applications. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible and NIR spectrum. Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-823-15.

🔎 Typical Applications

• Wide-area NIR survey and navigation of silicon wafers and semiconductor specimens at 10×
• Raman spectroscopy with NIR excitation lasers (785nm, 830nm, 1064nm) at low magnification
• NIR laser processing, delivery, and beam characterization requiring maximum working clearance
• Wide-area NIR overview before stepping up to 20×, 50×, or 100× NIR objectives
• NIR imaging in environmental chambers, cryostats, or vacuum systems requiring 30.5mm clearance
• Any wide-area NIR imaging or spectroscopy application requiring 10× magnification

📊 Key Specifications

University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.