Mitutoyo M Plan Apo NIR 10x Objective (NA 0.26, WD 30.5mm, Infinity, M26)
Regular price
$2,300.00
The Mitutoyo M Plan Apo NIR 10× Objective is a near-infrared optimized plan apochromat objective from Mitutoyo’s M Plan Apo NIR series — delivering wide-area 10× magnification with an exceptional 30.5mm working distance and optimized transmission across the visible and near-infrared spectrum (400–1000nm+). The ideal wide-area survey objective for NIR imaging, Raman spectroscopy, silicon wafer inspection, and NIR laser applications requiring maximum working clearance at low magnification.
KEY FEATURES
- NIR-optimized transmission (400–1000nm+) — optical glass and coatings selected for high transmission across the near-infrared spectrum, enabling silicon wafer inspection, Raman spectroscopy with NIR excitation lasers (785nm, 830nm, 1064nm), NIR laser delivery, and any wide-area NIR imaging application where standard objectives are opaque or poorly transmitting
- Super long working distance: 30.5mm — exceptional clearance for a 10× objective, providing ample room for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as clearance for beam delivery optics and collection systems
- 10× wide-area NIR overview — low magnification for rapid survey and navigation of large specimen areas in NIR, enabling efficient identification of regions of interest before stepping up to higher magnification NIR objectives (20×, 50×, 100×)
- Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible and NIR spectrum
- Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
- 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency NIR and visible light transmission and long service life
- Catalog number 378-823-15
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Technical Specifications
| Catalog Number | 378-823-15 |
| Magnification | 10× |
| Numerical Aperture (NA) | 0.26 |
| Immersion Medium | Dry (air) |
| Working Distance | 30.5mm (Super Long Working Distance) |
| Spectral Range | 400–1000nm+ (NIR-optimized) |
| Optical Design | M Plan Apo NIR (Plan Apochromat, NIR-optimized) |
| Correction | Infinity-corrected (brightfield) |
| Thread / Mount | M26 |
| Compatible Systems | Mitutoyo FS series; other infinity-corrected M26 systems |
| Country of Origin | Japan |
| SKU | 378-823-15 |
Microscope Compatibility
Typical Applications
Wide-area NIR survey and navigation of silicon wafers and semiconductor specimens at 10×
Raman spectroscopy with NIR excitation lasers (785nm, 830nm, 1064nm) at low magnification
NIR laser processing, delivery, and beam characterization requiring maximum working clearance
Wide-area NIR overview before stepping up to 20×, 50×, or 100× NIR objectives
NIR imaging in environmental chambers, cryostats, or vacuum systems requiring 30.5mm clearance
Any wide-area NIR imaging or spectroscopy application requiring 10× magnification
