Mitutoyo M Plan Apo 100x Objective (NA 0.70, WD 6mm, Infinity, M26)

The Mitutoyo M Plan Apo 100× (378-806-3) is the visible-light version of Mitutoyo’s flagship 100× plan apochromat objective — combining 100× magnification, plan apochromat correction, and a 6mm working distance that is 30–60× greater than standard 100× objectives. The 6mm working distance solves one of the most challenging problems in high-magnification microscopy: how to achieve 100× magnification when the specimen cannot be brought within 0.2mm of the objective front element. This enables high-magnification inspection of specimens in environmental chambers, cryostats, vacuum systems, industrial fixtures, and laser processing setups where standard 100× objectives are physically incompatible. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for accurate defect documentation and color-based analysis at 100×. At NA 0.70 with 0.7µm resolving power, this objective delivers sub-micron resolution for the most demanding visible-light inspection applications. The dry (air) design eliminates the need for immersion media, making it practical for use in industrial and semiconductor environments. For applications requiring NIR or SWIR transmission (silicon wafer backside inspection, Raman spectroscopy, NIR laser delivery), see the M Plan Apo NIR 100× (378-826-15). Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-806-3.