Mitutoyo M Plan Apo NIR 100x Objective (NA 0.70, WD 6.0mm, Infinity, M26)

The Mitutoyo M Plan Apo NIR 100× is the highest magnification objective in Mitutoyo’s M Plan Apo NIR series — combining 100× magnification, plan apochromat correction, and near-infrared optimization in a single objective with a 6.0mm working distance that is 30–60× greater than standard 100× objectives. The NIR designation indicates that this objective uses optical glass and anti-reflection coatings selected for high transmission across the 400–1000nm+ spectral range. At 100×, this NIR transmission capability is particularly valuable for silicon wafer and IC inspection — silicon is transparent at NIR wavelengths, enabling through-silicon imaging of subsurface structures, backside inspection of thinned wafers, and detection of subsurface defects that are invisible in visible light. For Raman spectroscopy, the high NIR transmission at 100× enables high-spatial-resolution Raman mapping with NIR excitation lasers (785nm, 830nm, 1064nm), where the long working distance provides clearance for Raman collection optics and environmental control systems. The 6.0mm working distance is exceptional for a 100× objective, providing practical clearance for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups where standard 100× objectives are physically incompatible. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible and NIR spectrum. Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-826-15.