Mitutoyo M Plan Apo NIR 100x Objective (NA 0.70, WD 6.0mm, Infinity, M26)

The Mitutoyo M Plan Apo NIR 100× Objective is a near-infrared optimized plan apochromat objective from Mitutoyo’s M Plan Apo NIR series — delivering high-magnification 100× imaging with an exceptional 6.0mm working distance and optimized transmission across the visible and near-infrared spectrum (400–1000nm+). The definitive choice for high-resolution NIR imaging, Raman spectroscopy mapping, silicon wafer inspection, and NIR laser processing applications where standard visible-optimized objectives have insufficient NIR transmission.

• 🔦 NIR-optimized transmission (400–1000nm+) — optical glass and coatings selected for high transmission across the near-infrared spectrum, enabling silicon wafer inspection (silicon is transparent at NIR wavelengths), Raman spectroscopy with NIR excitation lasers (785nm, 830nm, 1064nm), NIR laser delivery, and any high-resolution NIR imaging application where standard objectives are opaque or poorly transmitting
• 📏 Long working distance: 6.0mm — extraordinary clearance for a 100× objective (standard 100× objectives offer 0.1–0.2mm WD), providing 30–60× more clearance for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups, as well as ample room for beam delivery optics
• 🌟 Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible and NIR spectrum at 100×
• 🔬 NA 0.70 at 100× — practical numerical aperture for a long working distance NIR objective, delivering good resolution for high-magnification semiconductor inspection, Raman mapping, and NIR laser applications
• ♾️ Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
• 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency NIR and visible light transmission and long service life
• ✅ Catalog number 378-826-15

🔧 Product Description

The Mitutoyo M Plan Apo NIR 100× is the highest magnification objective in Mitutoyo’s M Plan Apo NIR series — combining 100× magnification, plan apochromat correction, and near-infrared optimization in a single objective with a 6.0mm working distance that is 30–60× greater than standard 100× objectives. The NIR designation indicates that this objective uses optical glass and anti-reflection coatings selected for high transmission across the 400–1000nm+ spectral range. At 100×, this NIR transmission capability is particularly valuable for silicon wafer and IC inspection — silicon is transparent at NIR wavelengths, enabling through-silicon imaging of subsurface structures, backside inspection of thinned wafers, and detection of subsurface defects that are invisible in visible light. For Raman spectroscopy, the high NIR transmission at 100× enables high-spatial-resolution Raman mapping with NIR excitation lasers (785nm, 830nm, 1064nm), where the long working distance provides clearance for Raman collection optics and environmental control systems. The 6.0mm working distance is exceptional for a 100× objective, providing practical clearance for specimens in environmental chambers, cryostats, vacuum systems, and laser processing setups where standard 100× objectives are physically incompatible. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible and NIR spectrum. Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Catalog number 378-826-15.

🔎 Typical Applications

• Silicon wafer and IC backside/through-silicon inspection at 100× using NIR transparency
• High-spatial-resolution Raman spectroscopy mapping with NIR excitation (785nm, 830nm, 1064nm)
• NIR laser processing, delivery, and beam characterization at high magnification
• Subsurface defect detection in silicon and other NIR-transparent materials
• High-magnification NIR imaging in environmental chambers, cryostats, or vacuum systems
• Any high-resolution NIR imaging or spectroscopy application requiring 100× magnification

📊 Key Specifications

University and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.