Mitutoyo 100x M Plan APO NIR High Resolution Objective 378-864-15

In stock

SKU: 378-864-15

$9,995.00
Mitutoyo 100X M Plan APO NIR High Resolution Objective 378-864-15

KEY FEATURES

  • Plan apochromat optics — corrected for spherical and chromatic aberrations across NIR wavelengths
  • Near-infrared optimized — exceptional transmission from visible through NIR (up to ~1,000 nm)
  • 0.70 numerical aperture — high-resolution imaging with long working distance for a 100X objective
  • Working distance: 6.0 mm — generous clearance for thick samples and industrial inspection
  • M26 thread (infinity corrected) — compatible with Mitutoyo FS series and standard infinity systems
  • Condition: New — genuine Mitutoyo objective
  • University purchase orders accepted
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Product Overview

The Mitutoyo 100X M Plan APO NIR (378-864-15) is a premium plan apochromat objective engineered specifically for near-infrared imaging applications where standard objectives fall short. With optimized NIR transmission up to approximately 1,000 nm, it delivers sharp, aberration-corrected images in wavelength ranges critical for semiconductor inspection, silicon wafer analysis, and NIR fluorescence microscopy. Despite its 100X magnification, the 6.0 mm working distance provides exceptional clearance — a hallmark of Mitutoyo's M Plan APO series — making it suitable for imaging through protective covers, thick substrates, or in reflected-light configurations. The 0.70 NA strikes an ideal balance between resolution and depth of field for demanding industrial and research applications. Manufactured in Japan to Mitutoyo's exacting standards.

Technical Specifications

Catalog Number 378-864-15
Magnification 100X
Numerical Aperture 0.70
Working Distance 6.0 mm
Thread M26 (Infinity Corrected)
Optical Design Plan Apochromat (APO)
Spectral Range Visible – NIR (~1,000 nm)
Condition New
Country of Origin Japan

Microscope Compatibility

Typical Applications

Semiconductor and silicon wafer inspection in NIR
NIR fluorescence and multiphoton microscopy
Industrial surface inspection through protective covers
Reflected-light microscopy on opaque or reflective samples
Laser beam profiling and photonics research

  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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