Mitutoyo 100x M Plan APO NIR High Resolution Objective 378-864-15

Mitutoyo 100X M Plan APO NIR High Resolution Objective 378-864-15

🔬 Plan apochromat optics — corrected for spherical and chromatic aberrations across NIR wavelengths
📡 Near-infrared optimized — exceptional transmission from visible through NIR (up to ~1,000 nm)
🎯 0.70 numerical aperture — high-resolution imaging with long working distance for a 100X objective
📏 Working distance: 6.0 mm — generous clearance for thick samples and industrial inspection
🧵 M26 thread (infinity corrected) — compatible with Mitutoyo FS series and standard infinity systems
✅ Condition: New — genuine Mitutoyo objective
🎓 University purchase orders accepted

🔧 Product Description

The Mitutoyo 100X M Plan APO NIR (378-864-15) is a premium plan apochromat objective engineered specifically for near-infrared imaging applications where standard objectives fall short. With optimized NIR transmission up to approximately 1,000 nm, it delivers sharp, aberration-corrected images in wavelength ranges critical for semiconductor inspection, silicon wafer analysis, and NIR fluorescence microscopy. Despite its 100X magnification, the 6.0 mm working distance provides exceptional clearance — a hallmark of Mitutoyo's M Plan APO series — making it suitable for imaging through protective covers, thick substrates, or in reflected-light configurations. The 0.70 NA strikes an ideal balance between resolution and depth of field for demanding industrial and research applications. Manufactured in Japan to Mitutoyo's exacting standards.

🔎 Typical Applications

• Semiconductor and silicon wafer inspection in NIR
• NIR fluorescence and multiphoton microscopy
• Industrial surface inspection through protective covers
• Reflected-light microscopy on opaque or reflective samples
• Laser beam profiling and photonics research

📊 Key Specifications

Spach Optics proudly accepts university purchase orders. Contact us with any questions — we're happy to help.