Nikon TU Plan ELWD 50x Objective

High-resolution 50× industrial objective with extra-long working distance for reflected light microscopy of opaque materials and metallurgical specimens.

• 🔬 50× Magnification, High NA — Excellent resolving power for detailed surface inspection and microstructural analysis.
• 📏 Extra-Long Working Distance (ELWD) — Extended clearance accommodates thick, uneven, or mounted specimens while maintaining optical performance.
• 🌓 TU Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
• ∞ CFI60 Infinity-Corrected — Compatible with Nikon's modern infinity optical platform for versatile system integration.
• ✨ Brand New Condition — Factory-new objective with full optical performance and manufacturer specifications.

🔧 Product Description

The Nikon CFI60 TU Plan Epi ELWD 50× Objective (MUE21500) is a high-performance industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective combines medium-high magnification with extended working distance, enabling detailed inspection of complex surface features while maintaining safe clearance between the objective and specimen.

The 50× magnification provides an optimal balance between field of view and resolution, making this objective ideal for examining microstructural features, grain boundaries, phase composition, and surface defects that require more detail than low-magnification objectives can provide, while offering a larger field of view than 100× objectives. This magnification range is particularly valuable for metallographic analysis, semiconductor inspection, and quality control applications where operators need to survey larger areas while maintaining the ability to resolve fine details.

The extra-long working distance (ELWD) is a critical advantage in industrial microscopy applications. Standard 50× objectives typically offer working distances of 2–3mm, which can be limiting when examining rough surfaces, tilted specimens, or samples mounted in fixtures. The extended working distance of this objective provides protective clearance while maintaining high optical performance, reducing the risk of lens contamination or damage during routine inspection work and enabling examination of samples with significant topographical variation.

The TU Plan (Transmitted/Universal Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge—essential for accurate measurement, documentation, and analysis. The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings and design elements that maximize contrast and image quality when examining opaque materials.

The CFI60 infinity-corrected optical system represents Nikon's modern microscope platform, enabling integration with tube lenses, beam splitters, camera systems, and other optical accessories without introducing aberrations. This design provides flexibility for advanced imaging workflows including digital documentation, measurement, and analysis.

This objective is compatible with Nikon upright reflected-light microscopes including the Eclipse LV series, Epiphot series, and other CFI60-compatible industrial microscope systems.

This unit is brand new, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Metallographic analysis and grain structure examination
• Semiconductor wafer and die inspection
• Surface defect detection and coating analysis
• Industrial quality control and failure analysis
• Materials science research and characterization
• Precision machined surface evaluation
• Educational and training laboratories
• Forensic materials examination

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.