Nikon 20x TU Plan ELWD Infinity Corrected Objective

Versatile 20× industrial objective with exceptional 19mm working distance for reflected light microscopy of opaque materials and metallurgical specimens.

• 🔬 20× Magnification, 0.40 NA — Ideal balance of field of view and resolution for general-purpose industrial microscopy.
• 📏 19mm Extra-Long Working Distance — Exceptional clearance accommodates thick specimens, fixtures, and challenging sample geometries.
• 🌓 TU Plan Epi Design — Flat-field correction with optimized contrast for reflected light microscopy of opaque materials.
• ∞ CFI60 Infinity-Corrected — Compatible with Nikon's modern infinity optical platform for versatile system integration.
• ✨ Brand New Condition — Factory-new objective with full optical performance and manufacturer specifications.

🔧 Product Description

The Nikon CFI60 TU Plan Epi ELWD 20× Objective (MUE21200) is a workhorse industrial objective designed for reflected light microscopy of opaque materials including metals, semiconductors, ceramics, and engineered surfaces. This objective is distinguished by its exceptional 19mm working distance—among the longest available for a 20× objective—enabling examination of challenging specimens that would be impossible to inspect with standard working distance objectives.

The 20× magnification and 0.40 numerical aperture provide an optimal balance between field of view and resolving power, making this objective ideal for initial specimen survey, feature location, and general-purpose inspection work. This magnification is particularly valuable in quality control environments where operators need to quickly scan larger areas while maintaining sufficient resolution to identify defects, measure features, and characterize surface conditions.

The 19mm extra-long working distance is the defining feature of this objective, providing unprecedented clearance for industrial microscopy applications. This extended working distance enables examination of:

• Thick specimens or samples mounted in fixtures
• Rough or highly textured surfaces with significant topographical variation
• Tilted or angled specimens requiring oblique viewing
• Samples requiring manipulation or probing during observation
• Specimens in environmental chambers or specialized holders

The TU Plan (Transmitted/Universal Plan) optical design delivers flat-field correction across the entire field of view, ensuring sharp focus from center to edge. This is essential for accurate measurement and documentation, as it eliminates the need to refocus when examining features at different positions in the field. The Epi (reflected light) designation indicates optimization for brightfield reflected light microscopy, with optical coatings that maximize contrast when examining opaque materials.

The CFI60 infinity-corrected optical system enables integration with tube lenses, beam splitters, camera systems, and other optical accessories without introducing aberrations, providing flexibility for digital documentation, measurement, and analysis workflows.

The M25 thread mount is compatible with Nikon infinity-corrected industrial microscopes including the Eclipse LV series and Epiphot series.

This unit is brand new, ready for demanding industrial inspection and materials analysis applications.

🔎 Typical Applications

• Metallographic analysis and quality control
• Semiconductor and electronics inspection
• Surface defect detection and characterization
• Failure analysis and root cause investigation
• Precision machined part inspection
• Materials science research
• Forensic materials examination
• Educational and training laboratories

📊 Key Specifications

University purchase orders accepted. Contact us for volume pricing and institutional procurement options.