Nikon CFI TU Plan ELWD 100x Reflected Light Objective (NA 0.80, Infinity)

The Nikon CFI TU Plan ELWD 100× is a specialized reflected light objective engineered for industrial and materials science applications where standard 100× objectives cannot be used due to specimen size, thickness, or mounting constraints. The 4.5mm working distance is exceptional for a 100× objective — standard 100× reflected light objectives typically offer 0.2–1.0mm of working distance, making them impractical for large wafers, thick substrates, mounted specimens, or components in fixtures. The ELWD design provides the clearance needed to image these specimens without risk of contact between the objective and the specimen surface. The NA 0.80 delivers high resolution and contrast for reflected light brightfield, DIC, and darkfield imaging of metals, semiconductors, ceramics, polished surfaces, and other opaque materials. The TU Plan optical design provides flat-field correction for consistent image quality across the full field of view. Compatible with Nikon CFI series industrial and upright microscopes including Eclipse LV, MA, and Ni series. Supplied new from stock, catalog number MUE21900.