Mitutoyo M Plan Apo 100x/0.55 Super Long Working Distance Objective - New / Open Box

In stock

SKU: 378-813-NOB

Regular price $2,800.00
Sale price $2,800.00 Regular price $4,995.00 save $2,195.00
The Mitutoyo M Plan Apo 100×/0.55 Super Long Working Distance Objective is one of the most remarkable objectives available for industrial and semiconductor microscopy — delivering 100× magnification with an extraordinary 13mm working distance and plan apochromat correction. At 13mm WD, this objective provides clearance that is 50–65× greater than standard 100× objectives (typically 0.1–0.2mm), enabling high-magnification inspection of specimens in fixtures, chambers, cryostats, laser processing systems, and other environments where standard objectives cannot reach. Offered here new/open box at significant savings versus the list price.

KEY FEATURES

  • Super long working distance: 13mm — the defining feature; 50–65× greater clearance than standard 100× objectives, enabling high-magnification imaging in environments and configurations that are impossible with conventional objectives
  • Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum at 100×
  • NA 0.55 at 100× — practical numerical aperture for a super long working distance objective, delivering good resolution for semiconductor IC inspection, defect analysis, and laser processing applications
  • Semiconductor IC inspection and laser repair — specifically designed for defect evaluation of semiconductor integrated circuits and precise repair with YAG lasers, where the long working distance provides clearance for laser delivery optics and specimen fixtures
  • Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
  • 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
  • Condition: New / open box — catalog number 378-813-3
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Product Overview

The Mitutoyo M Plan Apo 100×/0.55 SLWD is an extraordinary objective that solves one of the most challenging problems in high-magnification microscopy: how to achieve 100× magnification when the specimen cannot be brought within 0.2mm of the objective front element. With a 13mm working distance — compared to 0.1–0.2mm for standard 100× objectives — this objective provides clearance for specimens in environmental chambers, cryostats, vacuum chambers, laser processing systems, and industrial fixtures where standard objectives are physically incompatible. The plan apochromat correction ensures flat-field imaging with accurate chromatic registration across the full visible spectrum, essential for accurate defect documentation and color-based analysis at 100×. The M Plan Apo series is specifically designed for semiconductor IC defect evaluation and YAG laser repair applications, where the long working distance provides the clearance needed for laser delivery optics, beam steering components, and specimen fixtures to coexist with the imaging objective. The dry (air) design eliminates the need for immersion media, making it practical for use in industrial and semiconductor environments. Compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 thread nosepieces. Supplied new/open box, catalog number 378-813.

Technical Specifications

Catalog Number 378-813-3
Magnification 100×
Numerical Aperture (NA) 0.55
Immersion Medium Dry (air)
Working Distance 13mm (Super Long Working Distance)
Optical Design M Plan Apo (Plan Apochromat, reflected/transmitted light)
Correction Infinity-corrected
Thread / Mount M26
Compatible Systems Mitutoyo FS series; other infinity-corrected M26 systems
Country of Origin Japan
Condition New / open box
SKU 378-813

Microscope Compatibility

Typical Applications

Semiconductor IC defect evaluation and inspection at 100×
YAG laser repair of semiconductor circuits requiring clearance for laser optics
High-magnification imaging in environmental chambers, cryostats, or vacuum systems
Inspection of specimens in industrial fixtures or assemblies
Laser processing and micro-machining requiring simultaneous imaging and laser delivery
Any application requiring 100× magnification where standard working distance is insufficient
  • Designed for Mixed-Brand Lab Environments

    Olympus, Nikon, Zeiss, Leica components in one place

  • Quality-Verified New & Pre-Owned Equipment

    Professionally sourced and verified for performance

  • Backed by Spach Optics Warranty & Support

    Ideal for labs using multiple microscope platforms

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