Mitutoyo M Plan Apo 100x/0.55 Super Long Working Distance Objective - New / Open Box
Regular price
$2,800.00
Sale price
$2,800.00
Regular price
$4,995.00
save $2,195.00
The Mitutoyo M Plan Apo 100×/0.55 Super Long Working Distance Objective is one of the most remarkable objectives available for industrial and semiconductor microscopy — delivering 100× magnification with an extraordinary 13mm working distance and plan apochromat correction. At 13mm WD, this objective provides clearance that is 50–65× greater than standard 100× objectives (typically 0.1–0.2mm), enabling high-magnification inspection of specimens in fixtures, chambers, cryostats, laser processing systems, and other environments where standard objectives cannot reach. Offered here new/open box at significant savings versus the list price.
KEY FEATURES
- Super long working distance: 13mm — the defining feature; 50–65× greater clearance than standard 100× objectives, enabling high-magnification imaging in environments and configurations that are impossible with conventional objectives
- Plan apochromat (M Plan Apo) correction — Mitutoyo’s highest level of chromatic and spherical aberration correction for accurate, flat-field imaging across the full visible spectrum at 100×
- NA 0.55 at 100× — practical numerical aperture for a super long working distance objective, delivering good resolution for semiconductor IC inspection, defect analysis, and laser processing applications
- Semiconductor IC inspection and laser repair — specifically designed for defect evaluation of semiconductor integrated circuits and precise repair with YAG lasers, where the long working distance provides clearance for laser delivery optics and specimen fixtures
- Infinity-corrected, M26 thread — compatible with Mitutoyo FS series microscopes and other infinity-corrected systems with M26 nosepieces
- 🇯🇵 Mitutoyo quality, made in Japan — precision optical construction for consistent, high-efficiency light transmission and long service life
- Condition: New / open box — catalog number 378-813-3
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Technical Specifications
| Catalog Number | 378-813-3 |
| Magnification | 100× |
| Numerical Aperture (NA) | 0.55 |
| Immersion Medium | Dry (air) |
| Working Distance | 13mm (Super Long Working Distance) |
| Optical Design | M Plan Apo (Plan Apochromat, reflected/transmitted light) |
| Correction | Infinity-corrected |
| Thread / Mount | M26 |
| Compatible Systems | Mitutoyo FS series; other infinity-corrected M26 systems |
| Country of Origin | Japan |
| Condition | New / open box |
| SKU | 378-813 |
Microscope Compatibility
Typical Applications
Semiconductor IC defect evaluation and inspection at 100×
YAG laser repair of semiconductor circuits requiring clearance for laser optics
High-magnification imaging in environmental chambers, cryostats, or vacuum systems
Inspection of specimens in industrial fixtures or assemblies
Laser processing and micro-machining requiring simultaneous imaging and laser delivery
Any application requiring 100× magnification where standard working distance is insufficient
