Olympus IX Inverted Reflected Light Industrial Microscope - DIC, BF, Pol

The Olympus IX Inverted Metallurgical Microscope is a fully configured, reconditioned industrial reflected light system equipped with a complete set of UMPlanFL objectives, DIC/Nomarski contrast, polarized light, and a 1x C-mount camera port — a turnkey solution for materials characterization, failure analysis, and semiconductor inspection.

• 🔬 5-objective UMPlanFL set — 5x, 10x, 20x, 50x, and 100x infinity-corrected reflected light objectives
• 🌈 DIC/Nomarski contrast — U-DICR Nomarski slider for high-contrast surface topography imaging
• 🔵 Polarized light — polarized light filter cube for grain structure, stress, and anisotropy analysis
• 📷 Camera ready — trinocular port with 1x C-mount adapter for digital documentation
• 📍 Left-hand mechanical XY stage — precise specimen positioning for large sample navigation
• ✨ Reconditioned / excellent condition — professionally serviced and verified
• ⚙️ Custom configurations available — contact us to modify the setup for your application
• 🎓 University purchase orders accepted

🔧 Product Description

The Olympus IX inverted metallurgical microscope is a high-performance reflected light platform designed for industrial materials science, semiconductor inspection, and failure analysis applications. The inverted configuration places the objectives below the stage, allowing large, heavy, or irregularly shaped specimens — such as wafers, metal billets, and mounted cross-sections — to be placed flat on the stage without height constraints. This system is equipped with a full complement of five UMPlanFL infinity-corrected objectives spanning 5x through 100x, covering the complete magnification range needed for macro survey through high-resolution surface detail. The U-DICR Nomarski DIC slider adds differential interference contrast capability, revealing surface topography, grain boundaries, and thin film features with exceptional three-dimensional contrast. The polarized light filter cube enables grain structure analysis, stress birefringence imaging, and identification of anisotropic materials. A 4-position filter turret with brightfield cube, vertical illuminator with iris, 12V/100W lamphouse and power supply, left-hand mechanical XY stage, 10x widefield eyepieces, and 1x C-mount camera port complete this turnkey system. Custom configurations are available upon request.

🔎 Typical Applications

• Metallographic analysis of grain structure, inclusions, and phase distribution
• Semiconductor wafer and device inspection using reflected brightfield and DIC
• Failure analysis and surface defect characterization on metals and alloys
• Thin film and coating inspection with DIC/Nomarski contrast
• Polarized light analysis of anisotropic materials, stress birefringence, and crystal structure

📊 Key Specifications

Custom configurations are available upon request. University and institutional customers are welcome to submit purchase orders. Please contact us for net terms, procurement documentation, or application-specific configuration advice.