Olympus MPLN 100X Objective – Brightfield

The Olympus MPLN 100× Objective is a versatile plan achromat lens engineered for maximum magnification industrial microscopy applications. With 100× magnification and a 0.90 numerical aperture, this objective delivers well-balanced performance suitable for a wide range of materials analysis, metallography, semiconductor inspection, and quality control workflows requiring detailed observation at the highest magnification.

The MPLN series represents Olympus's M plan achromat design, offering excellent value and reliable performance for maximum magnification microscopy tasks. The ultra-high 0.90 numerical aperture provides exceptional light-gathering capability and resolution, revealing ultra-fine details in microstructures, grain boundaries, defects, and surface features that are critical for materials characterization and failure analysis at 100× magnification.

At 100× magnification, this objective provides maximum power for detailed structure observation, revealing submicron features and ultra-fine details. With a resolving power of 0.37 µm and a field of view of 0.22 mm, this objective enables observation of the finest features while maintaining practical usability for routine inspection and analysis.

The plan achromat optical design provides flat-field imaging with minimal curvature of field, ensuring sharp focus from the center to the edge of the field of view. This is important for photomicrography and digital documentation where consistent image quality across the entire viewing area is essential. The achromatic color correction delivers good color rendition and contrast for most industrial microscopy applications.

As an infinity-corrected objective with a 180 mm tube lens focal length, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques and modular microscopy accessories.

With a working distance of 0.21 mm, this objective is optimized for ultra-high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The short working distance is typical for high-NA objectives at this magnification and enables the maximum resolution possible with plan achromat optics.

Designed for reflected light brightfield microscopy, this objective features a standard RMS thread mount (20.32 mm × 36 TPI) and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in production and laboratory environments. For laboratories and quality control departments requiring dependable maximum magnification performance at an excellent value, the MPLN 100× is an ideal choice.