Olympus LCPLN20XIR 20X Objective – Near-IR (700-1600 nm)

20× near-infrared objective with long working distance and high transmission.

• 🌈 Optimized for Near-IR (700–1600 nm) — Excellent transmission for IR microscopy and inspection.
• 🔬 20× Magnification, NA 0.45 — Balanced resolution and light gathering for high-contrast imaging.
• 🧠 Plan Achromat Optical Design — Flat field and reduced aberrations for accurate imaging.
• 📏 Long Working Distance (~8.2–8.9 mm) — Accommodates thicker samples and inspection setups.
• ⚙️ Standard RMS Threaded Mount — Compatible with common upright microscope systems.

🧪 Product Description

The Olympus LCPLN20XIR 20× NIR Objective is a specialized microscope objective designed for advanced imaging that extends from the visible into the near-infrared (NIR) spectrum. Optimized for high transmission between 700 nm and 1600 nm, this objective excels in IR microscopy, silicon wafer inspection, and applications requiring reliable performance beyond the visible range.

With 20× magnification and a numerical aperture (NA) of 0.45, this objective provides a balanced combination of resolution and light collection suitable for general microscopy as well as IR imaging. Its Plan Achromat optical design minimizes chromatic and spherical aberrations, helping deliver consistently sharp images with high contrast across the field.

A long working distance of approximately 8.2–8.9 mm reduces the risk of specimen damage and offers additional space for thicker substrates, sample holders, or inspection tools — an important benefit in industrial and materials science workflows.

This objective features a standard RMS threaded mount for seamless integration with upright research microscopes used in laboratories and inspection suites.

🔎 Typical Applications

• Near-infrared (700–1600 nm) microscopy
• Silicon wafer and semiconductor inspection
• Visible and IR imaging workflows
• Materials science and research applications
• Flat-field documentation and measurement

📊 Key Specifications