Olympus LCPlan N 20X IR Objective | 0.45 NA Near-Infrared, Infinity Corrected

The Olympus LCPLN20XIR 20× NIR Objective is a specialized microscope objective designed for advanced imaging that extends from the visible into the near-infrared (NIR) spectrum. Optimized for high transmission between 700 nm and 1600 nm, this objective excels in IR microscopy, silicon wafer inspection, and applications requiring reliable performance beyond the visible range.

With 20× magnification and a numerical aperture (NA) of 0.45, this objective provides a balanced combination of resolution and light collection suitable for general microscopy as well as IR imaging. Its Plan Achromat optical design minimizes chromatic and spherical aberrations, helping deliver consistently sharp images with high contrast across the field.

A long working distance of approximately 8.2–8.9 mm reduces the risk of specimen damage and offers additional space for thicker substrates, sample holders, or inspection tools — an important benefit in industrial and materials science workflows.

This objective features a standard RMS threaded mount for seamless integration with upright research microscopes used in laboratories and inspection suites.

Why Use IR Objectives Instead of Standard Objectives?

Standard microscope objectives are optimized for visible light and perform poorly in near-infrared applications.

Olympus IR objectives:

Deliver higher transmission in NIR wavelengths
Improve contrast in silicon and semiconductor materials
Enable imaging beneath surfaces not visible with standard optics

This makes them essential for inspection, electronics, and advanced materials analysis