Olympus LCPLN100XIR 100X Objective – Near-IR (700-1600 nm)

Premium 100× near-infrared objective with long working distance and high transmission.

• 🔬 100× Magnification, NA 0.80 — Exceptional resolving power for ultra-high detail imaging.
• 🌈 Near-Infrared (700–1600 nm) Optimization — Superior transmission in IR imaging applications.
• 🧠 Plan Achromat Optical Design — Flat field and reduced aberrations across wavebands.
• 📏 Long Working Distance (~1.5 mm) — Room for thick samples, coverslips, and accessory mounts.
• ⚙️ RMS Thread Compatibility — Fits standard upright research microscope systems.

🧪 Product Description

The Olympus LCPLN100XIR 100× NIR Objective is a high-performance microscope lens designed for applications that demand extreme magnification and extended spectral capability. Optimized for the near-infrared (NIR) range from approximately 700 nm to 1600 nm, this objective delivers excellent transmission and contrast in both IR imaging and visible light microscopy. Such capabilities make it ideal for advanced industrial, materials science, and specialized biological imaging tasks that extend beyond traditional visible spectrum optics.

With 100× magnification and a numerical aperture (NA) of 0.80, this objective provides outstanding resolution and light-gathering ability for detailed analysis of fine structures. The Plan Achromat optical design minimizes chromatic and spherical aberrations, producing sharp images with even intensity across the entire field of view — an essential attribute for precise measurement, documentation, and analytical imaging workflows.

One of the hallmark features of the LCPLN100XIR is its long working distance (approximately 1.5 mm), which offers space above the sample for coverslips, thick substrates, probes, or accessory devices without sacrificing imaging performance. The RMS threaded mount ensures compatibility with a wide range of upright research microscope systems used in laboratories, inspection suites, and imaging facilities worldwide.

🔎 Typical Applications

• Near-infrared microscopy (700–1600 nm)
• Semiconductor and materials inspection
• High-resolution structural imaging
• Multi-modal visible + NIR workflows
• Precision imaging for measurement and documentation

📊 Key Specifications