Olympus MPLANFL N 5X Objective

Premium 5× objective with long working distance and dual imaging modes — ideal for versatile industrial microscopy.

• 🔬 5× Magnification, NA 0.15 — Wide field of view with excellent depth of field for overview imaging and inspection.
• 💡 Brightfield/Darkfield Capability — Dual-mode imaging for enhanced contrast and defect detection on reflective surfaces.
• 📏 Long Working Distance (20 mm) — Generous clearance provides specimen safety and accommodates thicker samples.
• 🧠 MPLANFL Plan Semi-Apochromat Design — Delivers flat-field imaging with excellent color correction across the visible spectrum.
• ⚙️ M26 Thread Mount — Compatible with Olympus industrial microscope systems.

🔧 Product Description

The Olympus MPLANFL 5× Objective is a versatile, high-performance objective engineered for industrial microscopy applications requiring both wide-field overview imaging and detailed inspection capability. As part of Olympus's Plan semi-apochromat series, this objective combines a generous 20 mm working distance with brightfield/darkfield imaging capability, making it an essential tool for materials analysis, quality control, and failure analysis in manufacturing and research environments.

The brightfield/darkfield capability allows you to switch between two complementary imaging modes without changing objectives. Brightfield mode provides standard reflected light imaging for general observation, while darkfield mode dramatically enhances contrast by illuminating the specimen at oblique angles — revealing surface defects, scratches, grain boundaries, and other features that would be invisible in brightfield alone.

At 5× magnification with a numerical aperture of 0.15, this objective delivers a wide field of view with excellent depth of field, making it ideal for initial specimen survey, large-area inspection, and locating regions of interest before switching to higher magnifications. The 20 mm working distance provides exceptional clearance for thick specimens, rough surfaces, or samples that require manipulation during observation, while also reducing the risk of objective damage from contact with the specimen.

The MPLANFL optical design ensures flat-field imaging with minimal distortion from center to edge, while the plan semi-apochromat correction delivers excellent color fidelity and chromatic aberration control. This combination makes the objective well-suited for both visual inspection and digital documentation of industrial samples.

🔎 Typical Applications

• Metallurgical analysis and microstructure examination
• Semiconductor wafer and IC inspection
• Surface defect detection and quality control
• Large-area specimen survey and overview imaging
• Failure analysis and forensic investigation
• Materials science research and characterization

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.