Olympus MPLFLN-BD 10X Objective – Brightfield/Darkfield

Premium 10× semi-apochromatic objective optimized for brightfield and darkfield observation — ideal for metallography, surface inspection, and scratch detection.

• 🔬 10× Magnification, NA 0.30 — Balanced resolution and field of view for detailed surface analysis.
• 🌓 Brightfield & Darkfield (BD) — Dual contrast modes for versatile observation and superior defect visualization.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (MPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.
• 🔍 Optimized for Surface Defects — Specially designed for examining scratches, etchings, and surface irregularities on polished materials.

🔧 Product Description

The Olympus MPLFLN-BD 10× Objective is a specialized semi-apochromatic lens engineered for industrial microscopy applications requiring both brightfield and darkfield observation. This dual-mode objective excels at revealing surface defects, scratches, and etchings on polished materials that are difficult or impossible to visualize with brightfield illumination alone.

Darkfield microscopy is a powerful technique for surface inspection and quality control. By illuminating the sample at oblique angles and collecting only scattered light, darkfield reveals surface irregularities, scratches, contamination, and structural defects with exceptional contrast. Features that appear nearly invisible in brightfield become dramatically visible in darkfield, making this objective essential for semiconductor wafer inspection, precision machining quality control, and materials characterization.

At 10× magnification with a numerical aperture of 0.30, this objective provides an ideal balance of resolution and field of view for surveying large sample areas while maintaining the detail necessary for defect identification. The semi-apochromatic optical design delivers superior color correction compared to achromatic objectives, ensuring accurate color rendition and high-contrast imaging across the visible spectrum.

The MPLFLN (M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology, providing flat-field imaging with minimal curvature of field. This ensures sharp focus from the center to the edge of the field of view, critical for photomicrography, image analysis, and accurate documentation of surface features across the entire viewing area.

Designed specifically for reflected light industrial microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust Japanese construction ensures reliable performance in demanding production and research environments where precision and repeatability are essential.

The MPLFLN-BD is particularly valuable for applications involving polished metal surfaces, semiconductor wafers, precision optics, and any material where surface quality is critical. Switch seamlessly between brightfield for general observation and darkfield for defect detection without changing objectives.

🔎 Typical Applications

• Metallography and polished metal surface inspection
• Semiconductor wafer defect detection and analysis
• Scratch and etching examination on polished surfaces
• Quality control and failure analysis
• Precision optics surface characterization
• Materials science and surface contamination detection

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.