spachoptics

Olympus MPLFLN-BD 20X Objective – Brightfield/Darkfield

Regular price $1,350.00
Sale price $1,350.00 Regular price $1,550.00 save $200.00

SKU: N5744300

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Premium 20× objective with brightfield and darkfield capability — ideal for industrial inspection and materials science applications.

  • 🔬 20× Magnification, NA 0.45 — High resolution for detailed imaging and defect detection.
  • 💡 Brightfield/Darkfield (BD) Capability — Dual-mode imaging for enhanced contrast and defect detection on reflective surfaces.
  • 📏 Working Distance (3 mm) — Adequate clearance for standard industrial specimens.
  • 🧠 MPLFLN Plan Semi-Apochromat Design — Delivers flat-field imaging with excellent color correction.
  • ⚙️ M26 Thread Mount — Compatible with Olympus industrial microscope systems.

🔧 Product Description

The Olympus MPLFLN-BD 20× Objective is a high-performance objective engineered for industrial microscopy applications requiring both detailed imaging and versatile contrast enhancement. As part of Olympus's Plan semi-apochromat series, this objective combines 20× magnification with dual brightfield/darkfield imaging capability, making it an essential tool for materials analysis, quality control, and failure analysis.

The brightfield/darkfield (BD) design allows you to switch between two complementary imaging modes without changing objectives. Brightfield mode provides standard reflected light imaging for general observation, while darkfield mode dramatically enhances contrast by illuminating the specimen at oblique angles — revealing surface defects, scratches, grain boundaries, and other features that would be invisible in brightfield alone.

At 20× magnification with a numerical aperture of 0.45, this objective delivers high resolution for detailed examination of industrial specimens. The MPLFLN optical design ensures flat-field imaging with minimal distortion from center to edge, while the plan semi-apochromat correction delivers excellent color fidelity and chromatic aberration control.


🔎 Typical Applications

  • Metallurgical analysis and microstructure examination
  • Semiconductor wafer and IC inspection
  • Surface defect detection and quality control
  • Failure analysis and forensic investigation
  • Materials science research and characterization

📊 Key Specifications

Specification

Details

Magnification

20×

Numerical Aperture (NA)

0.45

Imaging Modes

Brightfield / Darkfield (BD)

Optical Design

MPLFLN (Plan Semi-Apochromat)

Working Distance

3 mm

Mount

M26 Thread

Application

Industrial Reflected Light Microscopy

SKU

N5744300

Condition

Excellent, flawless optics


💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.

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