Olympus MPLANFL N 10x BD POL Objective

Premium 10× semi-apochromatic objective with brightfield, darkfield, and polarization capabilities — ideal for industrial metallography and materials science.

• 🔬 10× Magnification, NA 0.30 — Balanced resolution and field of view for detailed industrial inspection.
• 🌓 Brightfield & Darkfield (BD) — Dual contrast modes for versatile sample observation and defect detection.
• 🔄 Polarization (POL) Compatible — Analyze crystalline structures, stress patterns, and material orientation.
• 📐 Standard Pupil Position — Enables DIC prism integration for differential interference contrast imaging.
• 🎯 Plan Fluorite (PLANFL) Optics — Superior flatness and color correction across the entire field of view.

🔧 Product Description

The Olympus MPLANFL N 10× BD POL Objective is a versatile multi-mode objective engineered for demanding industrial microscopy applications. Combining brightfield, darkfield, and polarization capabilities in a single objective, this semi-apochromatic lens is an essential tool for metallography, materials science, semiconductor inspection, and quality control workflows requiring multiple contrast techniques.

Multi-modal microscopy enables comprehensive sample characterization without changing objectives. Switch seamlessly between brightfield for general observation, darkfield for surface defect detection and scratch visualization, and polarization for analyzing crystalline structures, grain boundaries, and stress patterns in materials. This versatility makes the MPLANFL N ideal for failure analysis and quality control where different contrast methods reveal complementary information.

At 10× magnification with a numerical aperture of 0.30, this objective delivers excellent resolution and a generous field of view for surveying large sample areas while maintaining the detail necessary for defect identification. The extra-long working distance provides clearance for thick specimens and reduces the risk of objective damage during sample manipulation.

The standard pupil position is a critical feature for advanced microscopy techniques. This design enables the integration of DIC (Differential Interference Contrast) prisms and polarizers, allowing you to add Nomarski contrast to your imaging toolkit. DIC reveals subtle height variations and surface topography that are invisible in conventional brightfield, making it invaluable for semiconductor wafer inspection and precision surface analysis.

The MPLANFL optical design represents Olympus's semi-apochromatic plan fluorite technology, delivering flat-field imaging with superior color correction across the visible spectrum. This ensures sharp, high-contrast images from center to edge, critical for documentation and quantitative image analysis.

Designed for reflected light industrial microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding industrial and research environments.

🔎 Typical Applications

• Metallography and metal alloy analysis
• Semiconductor wafer and IC inspection
• Materials science and crystallography
• Quality control and failure analysis
• Polarized light microscopy of minerals and crystals
• Surface defect detection and characterization

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.