Olympus MPLN50X 50X Objective – Brightfield

Versatile 50× plan achromat objective with high numerical aperture — ideal for high-magnification industrial microscopy and detailed materials analysis.

• 🔬 50× Magnification, NA 0.75 — High numerical aperture delivers excellent resolution and light-gathering capability.
• 🎯 Plan Achromat Design — Flat-field imaging with good color correction for accurate documentation.
• 🔆 Brightfield Optimized — Designed for standard brightfield reflected light microscopy.
• ⚖️ Balanced Performance — Optimal combination of resolution and field of view for general applications.
• 💰 Cost-Effective Solution — Excellent value for routine high-magnification inspection and quality control.

🔧 Product Description

The Olympus MPLN 50× Objective is a versatile plan achromat lens engineered for high-magnification industrial microscopy applications. With 50× magnification and a 0.75 numerical aperture, this objective delivers well-balanced performance suitable for a wide range of materials analysis, metallography, semiconductor inspection, and quality control workflows requiring detailed observation.

The MPLN series represents Olympus's M plan achromat design, offering excellent value and reliable performance for high-magnification microscopy tasks. The high 0.75 numerical aperture provides excellent light-gathering capability and resolution, revealing fine details in microstructures, grain boundaries, defects, and surface features that are critical for materials characterization and failure analysis at high magnification.

At 50× magnification, this objective provides high power for detailed structure observation while maintaining a practical field of view for efficient sample navigation. This makes it particularly well-suited for detailed feature examination, microstructure analysis, and quality control checks where high magnification is required to resolve fine details.

The plan achromat optical design provides flat-field imaging with minimal curvature of field, ensuring sharp focus from the center to the edge of the field of view. This is important for photomicrography and digital documentation where consistent image quality across the entire viewing area is essential. The achromatic color correction delivers good color rendition and contrast for most industrial microscopy applications.

With a working distance of 0.38 mm, this objective is optimized for high numerical aperture performance with polished metallographic specimens, semiconductor wafers, and other flat samples commonly encountered in industrial microscopy. The short working distance is typical for high-NA objectives at this magnification and enables the maximum resolution possible with plan achromat optics.

Designed for reflected light brightfield microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems via standard RMS thread mount. The robust construction and precision Japanese manufacturing ensure reliable performance in production and laboratory environments. For laboratories and quality control departments requiring dependable high-magnification performance at an excellent value, the MPLN 50× is an ideal choice.

🔎 Typical Applications

• High-magnification metallography and microstructure observation
• General-purpose quality control and inspection
• Materials characterization and grain boundary analysis
• Semiconductor wafer inspection
• Industrial research and development
• Sample documentation and reporting

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.