Olympus MPLN20X 20X Objective – Brightfield

Versatile 20× plan achromat objective with balanced performance — ideal for routine industrial microscopy and general-purpose materials analysis.

• 🔬 20× Magnification, NA 0.40 — Good resolution and light-gathering capability for detailed observation.
• 🎯 Plan Achromat Design — Flat-field imaging with good color correction for accurate documentation.
• 🔆 Brightfield Optimized — Designed for standard brightfield reflected light microscopy.
• ⚖️ Balanced Performance — Optimal combination of resolution, working distance, and field of view for general applications.
• 💰 Cost-Effective Solution — Excellent value for routine inspection and quality control workflows.

🔧 Product Description

The Olympus MPLN 20× Objective is a versatile plan achromat lens engineered for routine industrial microscopy applications. With 20× magnification and a 0.40 numerical aperture, this objective delivers well-balanced performance suitable for the widest range of general-purpose materials analysis, metallography, and quality control workflows.

The MPLN series represents Olympus's M plan achromat design, offering excellent value and reliable performance for everyday microscopy tasks. The 0.40 numerical aperture provides good resolution and light-gathering capability for observing microstructures, surface features, and material characteristics in typical industrial samples. This makes it an ideal workhorse objective for routine inspection, documentation, and analysis where the highest resolution is not required.

At 20× magnification, this objective strikes a practical balance between detail and field of view. It provides sufficient magnification to resolve important features while maintaining a field of view large enough for efficient sample navigation and contextual observation. This makes it particularly well-suited for initial sample survey, routine quality control checks, and general materials characterization.

The plan achromat optical design provides flat-field imaging with minimal curvature of field, ensuring sharp focus from the center to the edge of the field of view. This is important for photomicrography and digital documentation where consistent image quality across the entire viewing area is essential. The achromatic color correction delivers good color rendition and contrast for most industrial microscopy applications.

With a working distance of 1.3 mm, this objective provides adequate clearance for most standard polished samples, metallographic specimens, and flat materials commonly encountered in industrial microscopy. This working distance is typical for 20× objectives and is well-suited for routine observation of prepared samples.

Designed for reflected light brightfield microscopy, this objective is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems via standard RMS thread mount. The robust construction and precision Japanese manufacturing ensure reliable performance in production and laboratory environments. For laboratories and quality control departments requiring dependable performance at an excellent value, the MPLN 20× is an ideal choice.

🔎 Typical Applications

• Routine metallography and microstructure observation
• General-purpose quality control and inspection
• Materials characterization and analysis
• Educational and training applications
• Industrial research and development
• Sample documentation and reporting

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.