Olympus LMPLANFL N 5x BD Objective

Premium 5× long working distance objective with brightfield and darkfield capability — ideal for industrial inspection and materials science applications.

• 🔬 5× Magnification, NA 0.13 — Wide field of view with excellent depth of field for overview imaging and inspection.
• 💡 Brightfield/Darkfield (BD) Capability — Dual-mode imaging for enhanced contrast and defect detection on reflective surfaces.
• 📏 Long Working Distance (15 mm) — Generous clearance provides specimen safety and accommodates thicker samples or uneven surfaces.
• 🧠 LMPLFLN Plan Semi-Apochromat Design — Delivers flat-field imaging with excellent color correction across the visible spectrum.
• ⚙️ M26 Thread Mount — Compatible with Olympus BX and MX series industrial microscopes.

🔧 Product Description

The Olympus LMPLFLN 5× BD Objective is a versatile, long working distance objective engineered for industrial microscopy applications requiring both wide-field overview imaging and detailed defect detection. As part of Olympus's Plan semi-apochromat series, this objective combines an extended 15 mm working distance with dual brightfield/darkfield imaging capability, making it an essential tool for materials analysis, quality control, and failure analysis in manufacturing and research environments.

The brightfield/darkfield (BD) design allows you to switch between two complementary imaging modes without changing objectives. Brightfield mode provides standard reflected light imaging for general observation, while darkfield mode dramatically enhances contrast by illuminating the specimen at oblique angles — revealing surface defects, scratches, grain boundaries, and other features that would be invisible in brightfield alone.

At 5× magnification with a numerical aperture of 0.13, this objective delivers a wide field of view with excellent depth of field, making it ideal for initial specimen survey, large-area inspection, and locating regions of interest before switching to higher magnifications. The 15 mm working distance provides generous clearance for thick specimens, rough surfaces, or samples that require manipulation during observation, while also reducing the risk of objective damage from contact with the specimen.

The LMPLFLN optical design ensures flat-field imaging with minimal distortion from center to edge, while the plan semi-apochromat correction delivers excellent color fidelity and chromatic aberration control. This combination makes the objective well-suited for both visual inspection and digital documentation of industrial samples.

Compatible with Olympus BX and MX series industrial reflected light microscope systems, this objective integrates seamlessly into metallurgical, semiconductor, and materials science workflows.

🔎 Typical Applications

• Metallurgical analysis and microstructure examination
• Semiconductor wafer and IC inspection
• Surface defect detection and quality control
• Large-area specimen survey and overview imaging
• Failure analysis and forensic investigation
• Materials science research and characterization

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.