Olympus LMPLFLN 10X LWD Objective (RMS, 21mm WD)

Premium 10× semi-apochromatic objective with extra-long 21mm working distance — ideal for thick specimens, probe access, and applications requiring maximum clearance.

• 🔬 10× Magnification, NA 0.25 — Balanced resolution and field of view for detailed observation.
• 📏 Extra-Long Working Distance (21 mm) — Exceptional clearance for thick specimens, probe stations, and manipulation during observation.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (LMPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.
• ♾️ Infinity Corrected — Modern optical design for compatibility with advanced microscopy techniques.

🔧 Product Description

The Olympus LMPLFLN 10× Objective is a specialized extra-long working distance semi-apochromatic lens engineered for applications requiring exceptional specimen clearance. With an impressive 21 mm working distance — more than double that of standard objectives — this lens provides the space needed for thick samples, probe-based measurements, environmental chambers, and any application where maximum clearance is essential.

Extra-long working distance objectives are critical for advanced microscopy applications that standard objectives simply cannot accommodate. The 21 mm clearance allows you to work with very thick specimens, uneven or irregular surfaces, samples requiring heating or cooling stages, probe stations for electrical measurements, micromanipulators, or any setup where accessories must be positioned near the sample surface. This generous space also virtually eliminates the risk of objective damage from accidental contact with the specimen or stage.

Despite the extended working distance, this objective maintains excellent optical performance through Olympus's advanced LMPLFLN (Long Working Distance M Plan Fluorite) design. At 10× magnification with a numerical aperture of 0.25, it delivers sharp resolution and a wide field of view for surveying large sample areas. The semi-apochromatic optical design provides superior color correction compared to achromatic objectives, ensuring accurate color rendition and high-contrast imaging across the visible spectrum.

The plan fluorite optical system ensures flat-field imaging with minimal curvature of field, maintaining sharp focus from the center to the edge of the field of view. This is critical for photomicrography, image stitching, and quantitative image analysis where consistent focus across the entire viewing area is essential.

As an infinity-corrected objective, this lens is designed for modern microscope systems where the image is formed at infinity, allowing the insertion of optical components such as filters, polarizers, or DIC prisms in the parallel light path without introducing aberrations. This makes it compatible with advanced contrast techniques and modular microscopy accessories.

Featuring a standard RMS thread mount, this objective is compatible with most upright research microscope systems, including Olympus BX, GX, MX, and BHM series microscopes. The robust construction and precision Japanese manufacturing ensure reliable performance in demanding production and research environments.

🔎 Typical Applications

• Thick specimen observation and metallography
• Probe station measurements and electrical testing
• Micromanipulation and sample manipulation during observation
• Environmental chamber and heating/cooling stage applications
• Semiconductor and MEMS device inspection
• Materials science and industrial quality control

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.