Olympus LMPLFLN-BD 10X BD Objective (LWD 10mm WD)

Premium 10× semi-apochromatic objective with long working distance and brightfield/darkfield capabilities — ideal for thick specimens and industrial inspection requiring extra clearance.

• 🔬 10× Magnification, NA 0.25 — Balanced resolution and field of view for detailed observation.
• 📏 Long Working Distance (10 mm) — Generous clearance for thick specimens, probe access, and reduced risk of sample contact.
• 🌓 Brightfield & Darkfield (BD) — Dual contrast modes for versatile observation and superior defect detection.
• ✨ Semi-Apochromatic Correction — Superior color correction and image quality across the visible spectrum.
• 🎯 Plan Fluorite (LMPLFLN) Optics — Flat-field imaging from center to edge for accurate documentation.

🔧 Product Description

The Olympus LMPLFLN-BD 10× Objective is a specialized long working distance semi-apochromatic lens engineered for industrial microscopy applications requiring both brightfield and darkfield observation with exceptional specimen clearance. With a generous 10 mm working distance, this objective provides the space needed for thick samples, probe-based measurements, and manipulation during observation while maintaining excellent optical performance.

Long working distance objectives are essential when standard objectives cannot accommodate your sample geometry. The 10 mm clearance allows you to work with thick specimens, uneven surfaces, samples requiring environmental chambers, or applications where probe tips, heating stages, or other accessories must be positioned near the sample surface. This extra space also dramatically reduces the risk of objective damage from accidental contact with the specimen.

The dual brightfield/darkfield capability makes this objective exceptionally versatile for industrial inspection and quality control. Brightfield illumination provides standard observation for general sample characterization, while darkfield reveals surface defects, scratches, contamination, and structural irregularities with exceptional contrast. Features invisible in brightfield become dramatically visible in darkfield, making this objective invaluable for semiconductor inspection, precision machining quality control, and materials characterization.

At 10× magnification with a numerical aperture of 0.25, this objective delivers excellent resolution and a wide field of view for surveying large sample areas. The semi-apochromatic optical design provides superior color correction compared to achromatic objectives, ensuring accurate color rendition and high-contrast imaging across the visible spectrum.

The LMPLFLN (Long Working Distance M Plan Fluorite) optical system represents Olympus's advanced plan fluorite technology optimized for extended working distances. Despite the long working distance, this objective maintains flat-field imaging with minimal curvature of field, ensuring sharp focus from center to edge — critical for photomicrography and quantitative image analysis.

Designed for reflected light industrial microscopy, this objective features an M26 thread mount and is fully compatible with Olympus BX, GX, MX, and BHM series microscope systems. The robust Japanese construction ensures reliable performance in demanding production and research environments where precision and repeatability are essential.

🔎 Typical Applications

• Thick specimen observation and metallography
• Probe-based measurements and micromanipulation
• Semiconductor wafer and IC inspection
• Surface defect detection and scratch examination
• Quality control with environmental chambers or heating stages
• Materials science and failure analysis

📊 Key Specifications

💼 University Purchase Orders Accepted

Thank you for viewing! Please contact us with any questions about this objective or your specific industrial microscopy requirements.