{"product_id":"100x-nikon-cfi60-tu-plan-epi-elwd-infinity-corrected-objective","title":"Nikon CFI TU Plan ELWD 100x Reflected Light Objective (NA 0.80, Infinity)","description":"\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003eThe \u003cstrong\u003eNikon CFI TU Plan ELWD 100× Reflected Light Objective (NA 0.80)\u003c\/strong\u003e is an extra-long working distance (ELWD) infinity-corrected reflected light objective designed for industrial inspection, materials science, and semiconductor applications — delivering high-resolution 100× reflected light imaging with an exceptional 4.5mm working distance that provides ample clearance for large, thick, or mounted specimens that cannot be accommodated by standard short-working-distance objectives.\u003c\/p\u003e\n\n\u003cul style=\"font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003e \n\u003cli\u003e📏 \u003cstrong\u003eExtra-long working distance: 4.5mm\u003c\/strong\u003e — exceptional clearance at 100× magnification for imaging large, thick, or mounted specimens, wafers, PCBs, and components that standard 100× objectives cannot reach\u003c\/li\u003e\n\u003cli\u003e🔬 \u003cstrong\u003eNA 0.80 at 100×\u003c\/strong\u003e — high numerical aperture for excellent resolution and contrast in reflected light brightfield, DIC, and darkfield imaging\u003c\/li\u003e\n\u003cli\u003e💡 \u003cstrong\u003eReflected light (epi-illumination) design\u003c\/strong\u003e — optimized for incident light microscopy of opaque specimens including metals, semiconductors, ceramics, and polished surfaces\u003c\/li\u003e\n\u003cli\u003e♾️ \u003cstrong\u003eInfinity-corrected, M25 thread\u003c\/strong\u003e — compatible with Nikon CFI series upright and industrial microscopes including Eclipse LV, MA, and Ni series\u003c\/li\u003e\n\u003cli\u003e🇯🇵 \u003cstrong\u003eNikon quality, made in Japan\u003c\/strong\u003e — precision optical construction for consistent, high-efficiency light transmission and long service life\u003c\/li\u003e\n\u003cli\u003e✅ \u003cstrong\u003eNew\u003c\/strong\u003e — catalog number MUE21900\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\u003chr\u003e\n\n\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif;\"\u003e\u003cstrong\u003e🔧 Product Description\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003eThe Nikon CFI TU Plan ELWD 100× is a specialized reflected light objective engineered for industrial and materials science applications where standard 100× objectives cannot be used due to specimen size, thickness, or mounting constraints. The 4.5mm working distance is exceptional for a 100× objective — standard 100× reflected light objectives typically offer 0.2–1.0mm of working distance, making them impractical for large wafers, thick substrates, mounted specimens, or components in fixtures. The ELWD design provides the clearance needed to image these specimens without risk of contact between the objective and the specimen surface. The NA 0.80 delivers high resolution and contrast for reflected light brightfield, DIC, and darkfield imaging of metals, semiconductors, ceramics, polished surfaces, and other opaque materials. The TU Plan optical design provides flat-field correction for consistent image quality across the full field of view. Compatible with Nikon CFI series industrial and upright microscopes including Eclipse LV, MA, and Ni series. Supplied new from stock, catalog number MUE21900.\u003c\/p\u003e\n\n\u003chr\u003e\n\n\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif;\"\u003e\u003cstrong\u003e🔎 Typical Applications\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul style=\"font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003e \n\u003cli\u003eSemiconductor wafer and die inspection at 100× with extended working clearance\u003c\/li\u003e\n\u003cli\u003ePCB and electronics component inspection of thick or mounted assemblies\u003c\/li\u003e\n\u003cli\u003eMetallographic examination of large or mounted metal specimens\u003c\/li\u003e\n\u003cli\u003eCeramics, glass, and advanced materials surface inspection\u003c\/li\u003e\n\u003cli\u003eQuality control inspection of polished and coated surfaces\u003c\/li\u003e\n\u003cli\u003eAny application where standard 100× working distance is insufficient for the specimen\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\u003chr\u003e\n\n\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif;\"\u003e\u003cstrong\u003e📊 Key Specifications\u003c\/strong\u003e\u003c\/p\u003e\n\u003ctable style=\"width:100%; border-collapse: collapse; font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003e\n\u003ctr style=\"background-color: #f2f2f2;\"\u003e\n\u003cth style=\"text-align:left; padding: 6px; border: 1px solid #ddd;\"\u003eSpecification\u003c\/th\u003e\n\u003cth style=\"text-align:left; padding: 6px; border: 1px solid #ddd;\"\u003eDetails\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCatalog Number\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eMUE21900\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eMagnification\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003e100×\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eNumerical Aperture (NA)\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003e0.80\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eWorking Distance\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003e4.5mm (ELWD)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eImmersion Medium\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eDry (air)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eOptical Design\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCFI TU Plan ELWD (Extra-Long Working Distance)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eIllumination\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eReflected light (epi-illumination)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCorrection\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eInfinity-corrected\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eThread \/ Mount\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eM25\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCompatible Microscopes\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eNikon CFI Eclipse LV, MA, Ni series\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCountry of Origin\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eJapan\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eCondition\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eNew\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eSKU\u003c\/td\u003e\n\u003ctd style=\"padding: 6px; border: 1px solid #ddd;\"\u003eMUE21900\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/table\u003e\n\n\u003chr\u003e\n\n\u003cp style=\"font-family: 'Segoe UI Emoji', sans-serif; color: rgb(0,0,0);\"\u003e\u003cem\u003eUniversity and institutional purchase orders are welcome. Please contact us for invoicing and procurement documentation.\u003c\/em\u003e\u003c\/p\u003e","brand":"Spach Optics, Inc.","offers":[{"title":"Default Title","offer_id":51695352414509,"sku":"MUE21900","price":6100.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0933\/7965\/8029\/files\/NIKON-MUE21900-2.jpg?v=1765517827","url":"https:\/\/www.spachoptics.com\/products\/100x-nikon-cfi60-tu-plan-epi-elwd-infinity-corrected-objective","provider":"Spach Optics, Inc.","version":"1.0","type":"link"}